High Purity Tantalum Sputtering Target according to your request
Specification
Material: R05200
Purity: ≥99.95%, ≥99.99%
Dimension: Customization
Standard: ASTM B708-2012
Application: Used for optical fiber, semiconductor wafer and integrated circuit of sputtering deposition coating. Used for glass, ceramic, LCD coating. Used for the cathode sputtering coating, high vacuum suction active material etc.
Products Details
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About us
We are your reliable supplier in nonferrous metals, specializing in manufacture molybdenum, tungsten, tantalum, niobium, zirconium, and their alloys such as MoLa, TZM, MoCu, WLa, WNiFe, WNiCu, WCu, etc.
We produce a wide range of different forms including plate, strip&foil, bar, wire and precision machined parts such as crucibles, fasteners, ion implantation parts, MOCVD&MBE&MPCVD parts, balancing weights, radiation shieldings, etc. Also one of our major is hot zone of high temperature furnace and its accessories like heating elements, shieldings, shelves&trays, annealing&sintering boats, electrodes, as well as parts made of molybdenum, tungsten, tantalum, and their alloys.
FAQ
Q: Are you trading company or manufacturer ?
A: We are a factory.
Q: How long is your delivery time?
A: Generally it is 3-5 days if the goods are in stock. or it is 10 days if the goods are not in stock, it is according to quantity.
Q: Do you provide samples? is it free or extra ?
A: Yes, we could privide free samples, but do not pay the cost of freight.
Q: What is your terms of payment ?
A: T/T, L/C, paypal or Western Union.
Please contact us freely with any questions.
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